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ESL480: Difference between revisions

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| credit_structure = 3-0-0
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| pre_requisites =  
| overlaps = Some overlap with ESL737
| overlaps = Some overlap with [[ESL737]]
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== ESL480 : plasma Chemistry ==
== ESL480 : plasma Chemistry ==
Basic concepts of plasma, Thermal and non-thermal plasma chemistry, Elementary chemical reactions in plasmas, Various atomic and molecular collisions, Collision cross section, frequency and rate constant, Plasma sheath and potential; Chemical equilibrium and kinetics; Enthalpy and Gibbs free energy; Surface processes-plasma wall interaction- Adsorption, desorption, sticking coefficient, Chemical surface reactions, Surface diffusion. Ion bombardment; Uniform density discharge model, Particle and energy balance, Plasma diagnostics- Probe measurements, Emission and absorption spectroscopy, Applications of surface and volume plasma chemistry: Plasma etching, Chemical vapour deposition, flue and exhaust gas treatment, Excimer light source.
Basic concepts of plasma, Thermal and non-thermal plasma chemistry, Elementary chemical reactions in plasmas, Various atomic and molecular collisions, Collision cross section, frequency and rate constant, Plasma sheath and potential; Chemical equilibrium and kinetics; Enthalpy and Gibbs free energy; Surface processes-plasma wall interaction- Adsorption, desorption, sticking coefficient, Chemical surface reactions, Surface diffusion. Ion bombardment; Uniform density discharge model, Particle and energy balance, Plasma diagnostics- Probe measurements, Emission and absorption spectroscopy, Applications of surface and volume plasma chemistry: Plasma etching, Chemical vapour deposition, flue and exhaust gas treatment, Excimer light source.

Latest revision as of 16:33, 14 April 2026

ESL480
plasma Chemistry
Credits 3
Structure 3-0-0
Pre-requisites
Overlaps Some overlap with ESL737

ESL480 : plasma Chemistry

Basic concepts of plasma, Thermal and non-thermal plasma chemistry, Elementary chemical reactions in plasmas, Various atomic and molecular collisions, Collision cross section, frequency and rate constant, Plasma sheath and potential; Chemical equilibrium and kinetics; Enthalpy and Gibbs free energy; Surface processes-plasma wall interaction- Adsorption, desorption, sticking coefficient, Chemical surface reactions, Surface diffusion. Ion bombardment; Uniform density discharge model, Particle and energy balance, Plasma diagnostics- Probe measurements, Emission and absorption spectroscopy, Applications of surface and volume plasma chemistry: Plasma etching, Chemical vapour deposition, flue and exhaust gas treatment, Excimer light source.