ELL730
Appearance
| ELL730 | |
|---|---|
| I.C. Technology | |
| Credits | 3 |
| Structure | 3-0-0 |
| Pre-requisites | to be decide by instructor |
| Overlaps | |
ELL730 : I.C. Technology
[edit]Course Introduction, Modern Semiconductor IC fabrication Industrial/Academic Landscape; Overview of modern CMOS process flow – basic steps; Crystal growth and wafer basics; Cleanroom basics – environment, infrastructure, advanced MOS cleaning, getering etc. Lithography; Oxidation; Diffusion; Ion-Implantation; Thin-Film Deposition; Etching; Backend processes; Process Simulation- tools, techniques and methods; Advanced device fabrication concepts – I (SOI, FDSOI, etc); Advanced device fabrication concepts – II (organic, PV, hetero); Advanced device fabrication concepts – III (CNTs, Self-assembly etc). ELV730 Special Modules in V&ES–I 1 Credit (1-0-0)