CRL726
| CRL726 | |
|---|---|
| MEMS Design and Technology | |
| Credits | 3 |
| Structure | 3-0-0 |
| Pre-requisites | |
| Overlaps | |
CRL726 : MEMS Design and Technology
[edit]Introduction, origin and driving force for MEMS; extension of IC technologies for MEMS fabrication, major technologies for MEMSL: bulk and surface micromachining, LIGA process anisotropic etching of silicon, piezoresistive -piezoelectric effect, piezoresistive silicon based pressure sensor, capacitive pressure sensor, RF switch design, fabrication and characterization, actuation in MEMS, MEMS accelerometer design, fabrication, vibration sensor, energy harvesting devices, piezoelectric materials for MEMS, MEMS based RF and microwave circuits.