ESL481
| ESL481 | |
|---|---|
| plasma based Technologies for Functional Materials | |
| Credits | 3 |
| Structure | 3-0-0 |
| Pre-requisites | |
| Overlaps | Some overlap with ESL744, ESL737, MLL341, |
ESL481 : plasma based Technologies for Functional Materials
[edit]PHL702 Introduction to plasmas; Plasma sources; DC plasmas, Capacitively and inductively coupled Plasma Sources; Micro wave and ECR Plasma Source; Magnetron Sputtering, Plasma Enhanced Chemical Vapour Deposition (PECVD); Plasma etching, PIII, Plasma processes for thin films, Smart materials; Plasma process for Si based films, materials for lithium ion batteries (LIB), thermoelectric films, Hydrogen storage materials, 2-D materials, superconductive films.