ESL481: Difference between revisions
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| credit_structure = 3-0-0 | | credit_structure = 3-0-0 | ||
| pre_requisites = | | pre_requisites = | ||
| overlaps = Some overlap with ESL744, ESL737, MLL341, | | overlaps = Some overlap with [[ESL744]], [[ESL737]], [[MLL341]], | ||
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== ESL481 : plasma based Technologies for Functional Materials == | == ESL481 : plasma based Technologies for Functional Materials == | ||
PHL702 Introduction to plasmas; Plasma sources; DC plasmas, Capacitively and inductively coupled Plasma Sources; Micro wave and ECR Plasma Source; Magnetron Sputtering, Plasma Enhanced Chemical Vapour Deposition (PECVD); Plasma etching, PIII, Plasma processes for thin films, Smart materials; Plasma process for Si based films, materials for lithium ion batteries (LIB), thermoelectric films, Hydrogen storage materials, 2-D materials, superconductive films. | [[PHL702]] Introduction to plasmas; Plasma sources; DC plasmas, Capacitively and inductively coupled Plasma Sources; Micro wave and ECR Plasma Source; Magnetron Sputtering, Plasma Enhanced Chemical Vapour Deposition (PECVD); Plasma etching, PIII, Plasma processes for thin films, Smart materials; Plasma process for Si based films, materials for lithium ion batteries (LIB), thermoelectric films, Hydrogen storage materials, 2-D materials, superconductive films. | ||
Latest revision as of 16:33, 14 April 2026
| ESL481 | |
|---|---|
| plasma based Technologies for Functional Materials | |
| Credits | 3 |
| Structure | 3-0-0 |
| Pre-requisites | |
| Overlaps | Some overlap with ESL744, ESL737, MLL341, |
ESL481 : plasma based Technologies for Functional Materials
PHL702 Introduction to plasmas; Plasma sources; DC plasmas, Capacitively and inductively coupled Plasma Sources; Micro wave and ECR Plasma Source; Magnetron Sputtering, Plasma Enhanced Chemical Vapour Deposition (PECVD); Plasma etching, PIII, Plasma processes for thin films, Smart materials; Plasma process for Si based films, materials for lithium ion batteries (LIB), thermoelectric films, Hydrogen storage materials, 2-D materials, superconductive films.