ELp830: Difference between revisions
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== ELp830 : Semiconductor processing Laboratory == | == ELp830 : Semiconductor processing Laboratory == | ||
Deposition of Semiconductor Materials and Metals: Sputter Deposition, E-Beam Deposition, and Thermal Evaporation; Photolithography; Electron-Beam Lithography; Epitaxial Growth of Semiconductors, Materials Characterization. ELV830 Special Module in Low power IC Design 1 Credit (1-0-0) Special Module that focuses on special topics, development and Research problems of importance in the area of Low Power IC Design. | Deposition of Semiconductor Materials and Metals: Sputter Deposition, E-Beam Deposition, and Thermal Evaporation; Photolithography; Electron-Beam Lithography; Epitaxial Growth of Semiconductors, Materials Characterization. [[ELV830]] Special Module in Low power IC Design 1 Credit (1-0-0) Special Module that focuses on special topics, development and Research problems of importance in the area of Low Power IC Design. | ||
Latest revision as of 16:33, 14 April 2026
| ELp830 | |
|---|---|
| Semiconductor processing Laboratory | |
| Credits | 3 |
| Structure | 0-0-6 |
| Pre-requisites | |
| Overlaps | |
ELp830 : Semiconductor processing Laboratory
Deposition of Semiconductor Materials and Metals: Sputter Deposition, E-Beam Deposition, and Thermal Evaporation; Photolithography; Electron-Beam Lithography; Epitaxial Growth of Semiconductors, Materials Characterization. ELV830 Special Module in Low power IC Design 1 Credit (1-0-0) Special Module that focuses on special topics, development and Research problems of importance in the area of Low Power IC Design.