PYL704: Difference between revisions
| [checked revision] | [checked revision] |
Prashantt492 (talk | contribs) Creating course page via bot |
Bot: wrap bare course codes in wikilinks |
||
| Line 9: | Line 9: | ||
== pYL704 : Science and Technology of Thin Films == | == pYL704 : Science and Technology of Thin Films == | ||
Overlap with : PYL307 Kinetic theory of gases and basics of vacuum science and technology, Physical Vapor Deposition - Hertz Knudsen equation; mass evaporation rate; Knudsen cell, Directional distribution of evaporating species, Evaporation of elements, compounds, alloys, Raoult's law, Homogenous and Heterogeneous Nucleation, capillarity theory, atomistic and kinetic models of nucleation, basic modes of thin film growth, stages of film growth & cluster coalescence. E-beam beam evaporation, Molecular beam epitaxy and Pulsed Laser Deposition, Epitaxy–homo, hetero and coherent epilayers, lattice misfit and imperfections, epitaxy of compound semiconductors, scope of devices and applications, Glow Discharge and Plasma, Sputtering–mechanisms and yield, dc and rf sputtering, Bias sputtering, magnetically enhanced sputtering systems, reactive sputtering, Hybrid and Modified PVD- Ion plating, reactive evaporation, ion beam assisted deposition, Chemical Vapor Deposition - reaction chemistry and thermodynamics of CVD; Thermal CVD, Laser & plasma enhanced CVD, Atomic layer deposition, Electrodeposition, Spray pyrolysis. | Overlap with : [[PYL307]] Kinetic theory of gases and basics of vacuum science and technology, Physical Vapor Deposition - Hertz Knudsen equation; mass evaporation rate; Knudsen cell, Directional distribution of evaporating species, Evaporation of elements, compounds, alloys, Raoult's law, Homogenous and Heterogeneous Nucleation, capillarity theory, atomistic and kinetic models of nucleation, basic modes of thin film growth, stages of film growth & cluster coalescence. E-beam beam evaporation, Molecular beam epitaxy and Pulsed Laser Deposition, Epitaxy–homo, hetero and coherent epilayers, lattice misfit and imperfections, epitaxy of compound semiconductors, scope of devices and applications, Glow Discharge and Plasma, Sputtering–mechanisms and yield, dc and rf sputtering, Bias sputtering, magnetically enhanced sputtering systems, reactive sputtering, Hybrid and Modified PVD- Ion plating, reactive evaporation, ion beam assisted deposition, Chemical Vapor Deposition - reaction chemistry and thermodynamics of CVD; Thermal CVD, Laser & plasma enhanced CVD, Atomic layer deposition, Electrodeposition, Spray pyrolysis. | ||
Latest revision as of 16:44, 14 April 2026
| pYL704 | |
|---|---|
| Science and Technology of Thin Films | |
| Credits | 3 |
| Structure | 3-0-0 |
| Pre-requisites | |
| Overlaps | |
pYL704 : Science and Technology of Thin Films
Overlap with : PYL307 Kinetic theory of gases and basics of vacuum science and technology, Physical Vapor Deposition - Hertz Knudsen equation; mass evaporation rate; Knudsen cell, Directional distribution of evaporating species, Evaporation of elements, compounds, alloys, Raoult's law, Homogenous and Heterogeneous Nucleation, capillarity theory, atomistic and kinetic models of nucleation, basic modes of thin film growth, stages of film growth & cluster coalescence. E-beam beam evaporation, Molecular beam epitaxy and Pulsed Laser Deposition, Epitaxy–homo, hetero and coherent epilayers, lattice misfit and imperfections, epitaxy of compound semiconductors, scope of devices and applications, Glow Discharge and Plasma, Sputtering–mechanisms and yield, dc and rf sputtering, Bias sputtering, magnetically enhanced sputtering systems, reactive sputtering, Hybrid and Modified PVD- Ion plating, reactive evaporation, ion beam assisted deposition, Chemical Vapor Deposition - reaction chemistry and thermodynamics of CVD; Thermal CVD, Laser & plasma enhanced CVD, Atomic layer deposition, Electrodeposition, Spray pyrolysis.