ESL382: Difference between revisions
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| credit_structure = 3-0-0 | | credit_structure = 3-0-0 | ||
| pre_requisites = | | pre_requisites = | ||
| overlaps = Some overlap with ESL737 | | overlaps = Some overlap with [[ESL737]] | ||
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== ESL382 : plasma Sources and Diagnostics == | == ESL382 : plasma Sources and Diagnostics == | ||
Plasma Sources: Introductory concepts; Physics of high voltage sheaths; Particle and energy balance; Basic concepts of DC sources, RF sources (capacitively-coupled, inductively-coupled, helicon), microwave sources, resonance heated sources (electron cyclotron, ion cyclotron etc.). Plasma Diagnostics: In-situ probes: Lang-muir probes, Capacitive probes, E-probes and other particle analysers; Essential plasma spectroscopy measurements; Plasma imaging methods; Interferometry and reflectometry; Electromagnetic emission diagnostics; Underlying principle of other advanced optical diagnostics (Thomson scattering, Laser Induced Fluorescence (LIF), Laser Photo Detachment (LPD)). | Plasma Sources: Introductory concepts; Physics of high voltage sheaths; Particle and energy balance; Basic concepts of DC sources, RF sources (capacitively-coupled, inductively-coupled, helicon), microwave sources, resonance heated sources (electron cyclotron, ion cyclotron etc.). Plasma Diagnostics: In-situ probes: Lang-muir probes, Capacitive probes, E-probes and other particle analysers; Essential plasma spectroscopy measurements; Plasma imaging methods; Interferometry and reflectometry; Electromagnetic emission diagnostics; Underlying principle of other advanced optical diagnostics (Thomson scattering, Laser Induced Fluorescence (LIF), Laser Photo Detachment (LPD)). | ||
Latest revision as of 16:33, 14 April 2026
| ESL382 | |
|---|---|
| plasma Sources and Diagnostics | |
| Credits | 3 |
| Structure | 3-0-0 |
| Pre-requisites | |
| Overlaps | Some overlap with ESL737 |
ESL382 : plasma Sources and Diagnostics
Plasma Sources: Introductory concepts; Physics of high voltage sheaths; Particle and energy balance; Basic concepts of DC sources, RF sources (capacitively-coupled, inductively-coupled, helicon), microwave sources, resonance heated sources (electron cyclotron, ion cyclotron etc.). Plasma Diagnostics: In-situ probes: Lang-muir probes, Capacitive probes, E-probes and other particle analysers; Essential plasma spectroscopy measurements; Plasma imaging methods; Interferometry and reflectometry; Electromagnetic emission diagnostics; Underlying principle of other advanced optical diagnostics (Thomson scattering, Laser Induced Fluorescence (LIF), Laser Photo Detachment (LPD)).